Beilstein J. Nanotechnol.2018,9, 2049–2056, doi:10.3762/bjnano.9.194
-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular, ionbeamlithography (IBL) is a noteworthy method thanks to its robust direct
) radiation; focused ion beam (FIB); Fresnel zone plate; ionbeamlithography (IBL); nanopatterning; soft X-rays; Introduction
Requirements for focusing elements that work at extreme ultraviolet (EUV) and soft X-ray (SXR) energies are very different from those of the more familiar ultraviolet, visible or
is direct-write ionbeamlithography (IBL) and machining [32][33][34]. A well-known advantage of IBL is the ease of rapid prototyping of small-scale microfluidic, optical or electronic nanodevices. IBL has recently been applied for fabricating high-resolution functional FZPs [28][35][36] and for the
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Figure 1:
a) For the fabrication of an IBL FZP first, a ca. 100 nm gold layer is deposited on a commercial Si3...